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中芯国际称7nm EUV光刻机问题已解决 研发步入正轨
source link: https://tech.sina.com.cn/mobile/n/n/2019-12-10/doc-iihnzahi6438792.shtml
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在半导体工艺进入10nm节点之后，制造越来越困难，其中最复杂的一步——光刻需要用到EUV光刻机了，而后者目前只有荷兰ASML阿斯麦公司才能供应。中芯国际去年也订购了一台EUV光刻机，日前该公司表示与ASML之间已解决光刻机的问题，EUV技术
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